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The effect of substrate clamping on the paraelectric to antiferroelectric phase transition in Nd-doped BiFeO3 thin films

机译:衬底钳位对Nd掺杂BiFeO 3 薄膜中顺电 - 反铁电相变的影响

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摘要

© 2016 The AuthorsThin films were deposited on Pt/Ti/SiO2/Si substrates using pulsed laser deposition from a target with a composition (Bi0.825Nd0.175Fe0.97Ti0.03O3) with 5 mol% excess Bi2O3 within the antiferroelectric (AFE) region of the NdFeO3-BiFeO3 phase diagram. However, Raman spectroscopy and transmission electron microscopy (TEM) revealed that films consisted of a mosaic microstructure in which (AFE), ferroelectric (FE) and paraelectric (PE) phases coexisted. Variation in the spatial distribution of Nd is typically greater in bulk ceramics than in thin films and therefore, the absence of single phase AFE cannot be attributed to local changes in composition. Instead, it is proposed that clamping due to mismatch in thermal expansion coefficient with the substrate suppresses the large volume change associated with the PE-FE and PE-AFE transition in bulk and its absence in the thin film prevents an avalanche-like transition throughout grains, which in bulk sustains single phase AFE, irrespective of local deviations in the Nd concentration.
机译:©2016作者薄薄膜是使用脉冲激光沉积法从靶材上沉积在Pt / Ti / SiO2 / Si衬底上的,该靶材的成分为(Bi0.825Nd0.175Fe0.97Ti0.03O3),在反铁电(AFE)区域内有5mol%过量的Bi2O3。 NdFeO3-BiFeO3相图。但是,拉曼光谱和透射电子显微镜(TEM)显示,薄膜由镶嵌微结构组成,其中(AFE),铁电(FE)和顺电(PE)相共存。 Nd的空间分布变化通常在块状陶瓷中要比在薄膜中大,因此,不存在单相AFE不能归因于成分的局部变化。取而代之的是,建议由于热膨胀系数与基板的不匹配而进行的夹持可抑制与PE-FE和PE-AFE整体转变相关的大体积变化,而其在薄膜中的缺失可防止整个晶粒出现雪崩状转变。 ,无论Nd浓度的局部偏差如何,其总体上都维持单相AFE。

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